Bolometric properties of silicon thin-film structures fabricated by plasmachemical vapor-phase deposition
V. Yu. ZerovS. I. Vavilov State Optics Institute, St. PetersburgYu. V. KulikovS. I. Vavilov State Optics Institute, St. PetersburgV. G. MalyarovS. I. Vavilov State Optics Institute, St. PetersburgН. А. ФеоктистовS. I. Vavilov State Optics Institute, St. PetersburgI. A. KhrebtovA. F. Ioffe Physicotechnical Institute, Russian Academy of Sciences, St. Petersburg
ABI
Abstract
A method of fabricating uncooled thermally sensitive sandwich structures based on amorphous hydrated silicon films is discussed and experimental results are reported. The structures have an area of 10−4 cm2, a resistance of ≅10 kΩ, and a temperature coefficient of resistance ≃2%/K. At 30 Hz and a current of ≃1 μA, the excess noise exceeds the thermal resistance noise by a factor of 1.7.
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