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Mechanochemical penetration of helium atoms into Pd84.5-Si15.5 and Ni78-Si8-B14 eutectic amorphous films extended in liquid 3He and 4He

O. V. KlyavinIoffe Physicotechnical Institute, Russian Academy of Sciences, Politekhnicheskaya ul. 26, St. Petersburg, 194021, RussiaБ. А. МамыринIoffe Physicotechnical Institute, Russian Academy of Sciences, Politekhnicheskaya ul. 26, St. Petersburg, 194021, RussiaЛ. В. ХабаринIoffe Physicotechnical Institute, Russian Academy of Sciences, Politekhnicheskaya ul. 26, St. Petersburg, 194021, RussiaYu. M. ChernovIoffe Physicotechnical Institute, Russian Academy of Sciences, Politekhnicheskaya ul. 26, St. Petersburg, 194021, RussiaВ. З. БенгусPhysicotechnical Institute of Low Temperatures, National Academy of Sciences of Ukraine, Kharkov, 310086, UkraineE. D. TabachnikovaPhysicotechnical Institute of Low Temperatures, National Academy of Sciences of Ukraine, Kharkov, 310086, UkraineС. Э. ШумилинPhysicotechnical Institute of Low Temperatures, National Academy of Sciences of Ukraine, Kharkov, 310086, Ukraine
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Abstract

The penetration of helium atoms into amorphous films extended to fracture in liquid helium has been investigated. It is found that helium atoms penetrate into the eutectic alloy films Pd84.5-Si15.5 in 3He (T=0.5 K) and Ni78-Si8-B14 in 4He (T=4.2 K). The spectra of helium liberation from these materials after deformation are obtained upon dynamic (4–5 K/min) annealing at T=293–1323 K. The maximum amount of helium is observed in the regions of local plastic microshears running across the whole width of films and also in the sample regions containing fracture macrocracks and isolated groups of slip bands. The spectra of helium liberation from different regions of destroyed samples show several peaks that correlate with the temperatures of crystallization and melting of the studied films. The data obtained are interpreted within the model of mechanochemical penetration of helium atoms through the dynamically excited dislocation-like defects, which are typical of the amorphous films under consideration.

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