Article

Creation of microrelief on frontal surface of SC structures using selective coatings

Р. А. МуминовPhysicotechnical Institute, NPO Fizika-Solntse, the Academy of Sciences of the Republic of Uzbekistan, Tashkent, UzbekistanМ. Н. ТурсуновPhysicotechnical Institute, NPO Fizika-Solntse, the Academy of Sciences of the Republic of Uzbekistan, Tashkent, UzbekistanU. B. AbdievPhysicotechnical Institute, NPO Fizika-Solntse, the Academy of Sciences of the Republic of Uzbekistan, Tashkent, UzbekistanZ. S. SettarovaPhysicotechnical Institute, NPO Fizika-Solntse, the Academy of Sciences of the Republic of Uzbekistan, Tashkent, Uzbekistan

Applied Solar Energyjournal2008en

ABI

Abstract

A new technique of creating photosensitive structures on semiconductor materials is proposed. The morphology of the surface of the diffusion layers is considered. The creation of microrelief on the frontal surface of photosensitive structures is described.

Topics

Silicon Nanostructures and Photoluminescence Building materials and conservation TiO2 Photocatalysis and Solar Cells

Identifiers

DOI: 10.3103/s0003701x0801012x

Citations and references

Cited by 06 references

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