Article

Structural characterization and electro-physical properties for SiOC(–H) low-k dielectric films

A. S. ZakirovHeat Physics Department, Uzbek Academy of Sciences, Tashkent 100135, UzbekistanP. K. KhabibullaevHeat Physics Department, Uzbek Academy of Sciences, Tashkent 100135, UzbekistanChi Kyu Choi

Physica B Condensed Matterjournal2009en

ABI

Abstract

No abstract available.

Topics

Copper Interconnects and Reliability Semiconductor materials and devices Advanced ceramic materials synthesis

Identifiers

DOI: 10.1016/j.physb.2009.08.260

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