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Preparation of High Permittivity GdScO<sub>3</sub> Films by Liquid Injection MOCVD

K. HušekováM. JurkovičK. ČičoD. Machajdı́kEdmund DobročkaR. LuptákK. FröhlichAnna MackováNuclear Physics Institute, ASCR,
ECS Meeting Abstractsjournal2009en
ABI

Abstract

Abstract not Available.

Topics

Semiconductor materials and devicesSemiconductor materials and interfacesGas Sensing Nanomaterials and Sensors

Identifiers

DOI
10.1149/ma2009-02/34/2628

Citations and references

Cited by 00 references
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