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Effective control over near band-edge emission in ZnO/CuO multilayered films

Bunyod AllabergenovNano & Bio Research Division, Daegu Gyeongbuk Institute of Science and Technology (DGIST), 50-1 Sang-Ri, Heyonpung-Myeon, Dalseong-Gun, Daegu 711-873, South KoreaUlugbek ShaislamovDepartment of the advanced Materials and Engineering, Jeju National University, 1 Arail-dong, Jeju-si, Jeju-do, South KoreaHyunseok ShimNano & Bio Research Division, Daegu Gyeongbuk Institute of Science and Technology (DGIST), 50-1 Sang-Ri, Heyonpung-Myeon, Dalseong-Gun, Daegu 711-873, South KoreaMyeong-Jae LeeNano & Bio Research Division, Daegu Gyeongbuk Institute of Science and Technology (DGIST), 50-1 Sang-Ri, Heyonpung-Myeon, Dalseong-Gun, Daegu 711-873, South KoreaA. MatnazarovDepartment of Transport Systems, Urgench State University (USU), 14 Khamid Alimjon, Urgench 220-100, UzbekistanByeongdae ChoiNano & Bio Research Division, Daegu Gyeongbuk Institute of Science and Technology (DGIST), 50-1 Sang-Ri, Heyonpung-Myeon, Dalseong-Gun, Daegu 711-873, South Korea
Optical Materials Expressjournal2017en
ABI

Abstract

We report on a study of the microstructural and photoluminescent properties of ZnO/CuO multilayered films. Multilayered ZnO/CuO thin films were deposited on amorphous SiO2/Si substrates by a pulsed laser technique and their microstructural and optical properties were characterized by transmission electron microscopy (TEM) and photoluminescence spectroscopy. TEM and XRD analyses of annealed ZnO/CuO films reveal the formation of multiple crystallographic defects and modification of the dominant growth plane, indicating effective doping of Cu atoms into the ZnO lattice. Consequently, near-band-edge emission in ZnO can be controlled through the number of CuO layers. Redshift of the near-band-edge emission peak from 385 nm up to 422 nm is achieved by increasing the number of CuO layers up to a certain number, above which a downward shift is observed. The results demonstrate that the emission properties of ZnO can be modified and precisely controlled by incorporation of CuO thin layers as a Cu-doping source.

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