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Work: Structial, Electrophysical, and Optical Properties of ITO Films Produced by the Modified CVD Method

  1. Physical properties of RF sputtered ITO thin films and annealing effect

    L. Kerkache, A. Layadi, El Hadj Dogheche +1

    Article20053 citations
    ABI
  2. Untitled

    Other1 citations
    ABI
  3. Untitled

    Other1 citations
    ABI
  4. Untitled

    Other1 citations
    ABI