Works cited by this work

26 works

Work: Customized modulation on plasma uniformity by non-uniform magnetic field in capacitively coupled plasma

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7. Effect of a dielectric layer on plasma uniformity in high frequency electronegative capacitive discharges

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8. Spatial symmetry breaking in single-frequency CCP discharge with transverse magnetic field

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9. Reduction of plasma-induced damage in n-type GaN by multistep-bias etching in inductively coupled plasma reactive ion etching

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10. Effects of process parameters and chamber structure on plasma uniformity in a large-area capacitively coupled discharge

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