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Work: Collisionless magnetized rf sheath resonance heating in dual-frequency capacitively coupled plasmas

  1. Electrostatic modelling of dual frequency rf plasma discharges

    P C Boyle, A. R. Ellingboe, M. M. Turner

    Article20042 citations
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  2. Dual excitation reactive ion etcher for low energy plasma processing

    H. Gotô, Hans-Dirk Löwe, Tadahiro Ohmi

    Article19922 citations
    ABI
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