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Synthesis of Large‐Area MoS<sub>2</sub> Atomic Layers with Chemical Vapor Deposition

Yi‐Hsien LeeInstitute of Atomic and Molecular Sciences, Academia Sinica, Taipei, TaiwanXinquan ZhangDepartment of Chemistry, Tunghai University, No. 181, Sec. 3, Taichung Port Rd., Taichung City 40704, Taiwan,Wenjing ZhangInstitute of Atomic and Molecular Sciences, Academia Sinica, No. 1, Roosevelt Rd., Sec. 4, Taipei, 10617, Taiwan,Mu‐Tung ChangInstitute of Physics, Academia Sinica, 128 Sec. 2, Academia Rd., Nankang, Taipei 11529, TaiwanCheng‐Te LinInstitute of Atomic and Molecular Sciences, Academia Sinica, No. 1, Roosevelt Rd., Sec. 4, Taipei, 10617, Taiwan,Kai‐Di ChangDepartment of Chemistry, Tunghai University, No. 181, Sec. 3, Taichung Port Rd., Taichung City 40704, Taiwan,Ya-Chu YuDepartment of Chemistry, Tunghai University, No. 181, Sec. 3, Taichung Port Rd., Taichung City 40704, Taiwan,Jacob Tse‐Wei WangInstitute of Atomic and Molecular Sciences, Academia Sinica, No. 1, Roosevelt Rd., Sec. 4, Taipei, 10617, Taiwan,Chia‐Seng ChangInstitute of Physics, Academia Sinica, 128 Sec. 2, Academia Rd., Nankang, Taipei 11529, TaiwanLain‐Jong LiInstitute of Atomic and Molecular Sciences, Academia Sinica, No. 1, Roosevelt Rd., Sec. 4, Taipei, 10617, Taiwan,Tsung‐Wu LinDepartment of Chemistry, Tunghai University, No. 181, Sec. 3, Taichung Port Rd., Taichung City 40704, Taiwan,
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Abstract

Large-area MoS(2) atomic layers are synthesized on SiO(2) substrates by chemical vapor deposition using MoO(3) and S powders as the reactants. Optical, microscopic and electrical measurements suggest that the synthetic process leads to the growth of MoS(2) monolayer. The TEM images verify that the synthesized MoS(2) sheets are highly crystalline.

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