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Near-Infrared Photodetector Based on MoS<sub>2</sub>/Black Phosphorus Heterojunction

Lei YeDepartment of Electronic Engineering, Materials Science and Technology Research Center, The Chinese University of Hong Kong, Shatin, New Territories, Hong Kong, People’s Republic of ChinaHao LiDepartment of Electronic Engineering, Materials Science and Technology Research Center, The Chinese University of Hong Kong, Shatin, New Territories, Hong Kong, People’s Republic of ChinaZefeng ChenDepartment of Electronic Engineering, Materials Science and Technology Research Center, The Chinese University of Hong Kong, Shatin, New Territories, Hong Kong, People’s Republic of ChinaJianbin XuDepartment of Electronic Engineering, Materials Science and Technology Research Center, The Chinese University of Hong Kong, Shatin, New Territories, Hong Kong, People’s Republic of China
2016en
ABI

Abstract

Two-dimensional (2D) materials present their excellent properties in electronic and optoelectronic applications, including in ultrafast carrier dynamics, layer-dependent energy bandgap, tunable optical properties, low power dissipation, high mobility, transparency, flexibility, and the ability to confine electromagnetic energy to extremely small volumes. Herein, we demonstrate a photodetector with visible to near-infrared detection range, based on the heterojunction fabricated by van der Waals assembly between few-layer black phosphorus (BP) and few-layer molybdenum disulfide (MoS2). The heterojunction with electrical characteristics which can be electrically tuned by a gate voltage achieves a wide range of current-rectifying behavior with a forward-to-reverse bias current ratio exceeding 103. The photoresponsivity (R) of the photodetector is about 22.3 A W–1 measured at λ = 532 nm and 153.4 mA W–1 at λ = 1.55 μm with a microsecond response speed (15 μs). In addition, its specific detectivity D* is calculated to have the maximum values of 3.1 × 1011 Jones at λ = 532 nm, while 2.13 × 109 Jones at λ = 1550 nm at room temperature.

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