Effect of removing internal residual metallic phases on wear resistance of polycrystalline diamond compacts
Chengliang LiuInstitute of atomic and molecular physics, Sichuan University, Chengdu, 610065, ChinaZili KouInstitute of atomic and molecular physics, Sichuan University, Chengdu, 610065, ChinaDuanwei HeInstitute of atomic and molecular physics, Sichuan University, Chengdu, 610065, ChinaYing ChenInstitute of atomic and molecular physics, Sichuan University, Chengdu, 610065, ChinaKaixue WangInstitute of atomic and molecular physics, Sichuan University, Chengdu, 610065, ChinaBo HuiInstitute of atomic and molecular physics, Sichuan University, Chengdu, 610065, ChinaRui ZhangInstitute of atomic and molecular physics, Sichuan University, Chengdu, 610065, ChinaYanfei WangInstitute of atomic and molecular physics, Sichuan University, Chengdu, 610065, China
2011en
ABI
Abstract
No abstract available.
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Cited by 20 references