Works citing this work

2 works

Work: Electrical Defects in Silicon Introduced by Sputtering and Sputter‐Etching

1. Tunable defect engineering in TiON thin films by multi-step sputtering processes: from a Schottky diode to resistive switching memory

   Teng‐Yu Su, Chi‐Hsin Huang, Yu‐Chuan Shih +5

   ArticleAdvanced Memory and Neural ComputingJournal of Materials Chemistry C20170 citations

   ABIABI:AkademIndex/openalex/2017.article.000071

2. Interfacial interactions and free volume in multicomponent titanium-based carbon-nitrides coatings

   Matlab N. Mirzayev, A. Atilgan, S.F. Samadov +12

   ArticleMuon and positron interactions and applicationsCeramics International20260 citations

   ABIABI:AkademIndex/openalex/2026.article.002320