Direct splitting of water under visible light irradiation with an oxide semiconductor photocatalyst
Zhigang ZouPhotoreaction Control Research Center, National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan. [email protected]Jinhua YeMaterials Engineering Laboratory (MEL), National Institute for Materials Science (NIMS), 1-2-1 Sengen, Tsukuba, 305-0047, Ibaraki, JapanKazuhiro SayamaPhotoreaction Control Research Center (PCRC), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, 305-8565, Ibaraki, JapanHironori ArakawaPhotoreaction Control Research Center (PCRC), National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, 305-8565, Ibaraki, Japan
2001en
ABI
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