Plasmonics for extreme light concentration and manipulation
Jon A. SchullerEdward S. BarnardGeballe Laboratory for Advanced Materials, Stanford, 94305, California, USAWenshan CaiGeballe Laboratory for Advanced Materials, Stanford, 94305, California, USAYoung Chul JunGeballe Laboratory for Advanced Materials, Stanford, 94305, California, USAJustin S. WhiteGeballe Laboratory for Advanced Materials, Stanford, 94305, California, USAMark L. BrongersmaGeballe Laboratory for Advanced Materials, Stanford, 94305, California, USA
2010en
ABI
Abstract
No abstract available.
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Cited by 30 references