Growth and roughness dependent wetting properties of CeO2 films prepared by glancing angle deposition
Tao AnCollege of Science, Laboratory of Materials Design and Quantum Simulation, Changchun University, Changchun 130022, People's Republic of ChinaXiao‐Fang DengCollege of Science, Laboratory of Materials Design and Quantum Simulation, Changchun University, Changchun 130022, People's Republic of ChinaShujie LiuCollege of Science, Laboratory of Materials Design and Quantum Simulation, Changchun University, Changchun 130022, People's Republic of ChinaShuang WangCollege of Science, Laboratory of Materials Design and Quantum Simulation, Changchun University, Changchun 130022, People's Republic of ChinaJinning JuCollege of Science, Laboratory of Materials Design and Quantum Simulation, Changchun University, Changchun 130022, People's Republic of ChinaChunyue DouCollege of Science, Laboratory of Materials Design and Quantum Simulation, Changchun University, Changchun 130022, People's Republic of China
2018en
ABI
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Cited by 20 references