Optimized antireflection coatings for high-efficiency silicon solar cells
Jianhua ZhaoCentre of Photovoltaic Devices and Systems, University of New South Wales, Kingston, AustraliaMartin A. GreenCentre of Photovoltaic Devices and Systems, University of New South Wales, Kingston, Australia
1991en
ABI
Abstract
Antireflection coatings for silicon solar cells have been optimized both theoretically and experimentally for a range of possible situations, such as single-layer and double-layer coatings, and on planar and microgrooved surfaces. The effect of a thin passivating silicon dioxide layer under the coating was also considered. A critical passivating oxide thickness of about 300 AA was found to be important for the design of these coatings. A new half-quarter-wavelength double layer antireflection coating can be achieved with very low reflection if the passivating oxide has to be thicker than this critical thickness.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">></ETX>
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