Electrical resistance of metallic contacts on silicon and germanium during indentation
George M. PharrDepartment of Materials Science, Rice University, Houston, Texas, P.O. Box 1892, 77251, USAW. C. OliverMetals and Ceramics Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee, 37831, USARobert F. CookIBM Research Division, Thomas J. Watson Research Center, Yorktown Heights, New York, 10598, USAP. D. KirchnerIBM Research Division, Thomas J. Watson Research Center, Yorktown Heights, New York, 10598, USAMarkus KrollIBM Research Division, Thomas J. Watson Research Center, Yorktown Heights, New York, 10598, USAT. R. DingerIBM Research Division, Thomas J. Watson Research Center, Yorktown Heights, New York, 10598, USADavid ClarkeMaterials Department, University of California at Santa Barbara, Santa Barbara, California, 93106, USA
1992en
ABI
Abstract
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Cited by 20 references