Dual Position Sensitive MWPC for tracking reaction products at VAMOS++
M. VandebrouckGANIL, CEA/DSM – CNRS/IN2P3, Bd Henri Becquerel, BP 55027, F-14076 Caen Cedex 5, FranceA. LemassonGANIL, CEA/DSM – CNRS/IN2P3, Bd Henri Becquerel, BP 55027, F-14076 Caen Cedex 5, FranceM. RejmundGANIL, CEA/DSM – CNRS/IN2P3, Bd Henri Becquerel, BP 55027, F-14076 Caen Cedex 5, FranceG. FrémontGANIL, CEA/DSM – CNRS/IN2P3, Bd Henri Becquerel, BP 55027, F-14076 Caen Cedex 5, FranceJ. PancinGANIL, CEA/DSM – CNRS/IN2P3, Bd Henri Becquerel, BP 55027, F-14076 Caen Cedex 5, FranceA. NavinGANIL, CEA/DSM – CNRS/IN2P3, Bd Henri Becquerel, BP 55027, F-14076 Caen Cedex 5, FranceC. MichelagnoliGrand Accélérateur National d'Ions LourdsJ. GoupilGANIL, CEA/DSM – CNRS/IN2P3, Bd Henri Becquerel, BP 55027, F-14076 Caen Cedex 5, FranceC. SpitaëlsGANIL, CEA/DSM – CNRS/IN2P3, Bd Henri Becquerel, BP 55027, F-14076 Caen Cedex 5, FranceB. JacquotGANIL, CEA/DSM – CNRS/IN2P3, Bd Henri Becquerel, BP 55027, F-14076 Caen Cedex 5, France
2015en
ABI
Abstract
No abstract available.
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Cited by 30 references