Thermal atomic layer deposition of AlOxNy thin films for surface passivation of nano-textured flexible silicon
Piyush K. ParasharCentre for Energy Studies, Indian Institute of Technology Delhi, New Delhi 110016, IndiaSami KinnunenDepartment of Physics, University of Jyväskylä, P.O. Box 35, 40014, FinlandTimo SajavaaraDepartment of Physics, University of Jyväskylä, P.O. Box 35, 40014, FinlandJ. Jussi ToppariDepartment of Physics and Nanoscience Center, University of Jyväskylä, P.O. Box 35, 40014, FinlandVamsi K. KomaralaCentre for Energy Studies, Indian Institute of Technology Delhi, New Delhi 110016, India
2019en
ABI
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Cited by 20 references