Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process
Jaan AarikInstitute of Materials Science, University of Tartu, 18 Ülikooli Steet, 50090 Tartu, EstoniaAleks AidlaInstitute of Materials Science, University of Tartu, 18 Ülikooli Steet, 50090 Tartu, EstoniaTeet UustareInstitute of Materials Science, University of Tartu, 18 Ülikooli Steet, 50090 Tartu, EstoniaMikko RitalaDepartment of Chemistry, University of Helsinki, P.O. Box 55 (A.I. Virtasen aukio 1), FIN 00014 University of Helsinki, Helsinki, FinlandMarkku LeskeläDepartment of Chemistry, University of Helsinki, P.O. Box 55 (A.I. Virtasen aukio 1), FIN 00014 University of Helsinki, Helsinki, Finland
2000en
ABI
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Cited by 40 references