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Works citing this work

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  1. Tuning barrier height and enhancing electrical properties of MOS heterojunctions using Fe2O3 doped MoO3 nanocomposite interlayer on Ni/Cr/n-GaN for optoelectronic devices

    Karri Aswini, Chaitanya Kumar Kunapalli, K. Munirathnam +7

    ArticleSemiconductor materials and interfacesPhysica B Condensed Matter20250 citations
    ABI