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Single-Molecule AFM Study of DNA Damage by <sup>1</sup>O<sub>2</sub> Generated from Photoexcited C<sub>60</sub>

Ankita RayLaboratorium für Organische Chemie, ETH Zürich, Vladimir-Prelog-Weg 3, CH-8093 Zürich, SwitzerlandKorinne LiosiLaboratorium für Organische Chemie, ETH Zürich, Vladimir-Prelog-Weg 3, CH-8093 Zürich, SwitzerlandShivaprakash N. RamakrishnaLaboratory for Surface Science and Technology, Department of Materials, ETH Zürich, Vladimir-Prelog-Weg 5, CH-8093 Zürich, SwitzerlandNicholas D. SpencerLaboratory for Surface Science and Technology, Department of Materials, ETH Zürich, Vladimir-Prelog-Weg 5, CH-8093 Zürich, SwitzerlandAkinori KuzuyaDepartment of Chemistry and Materials Engineering, Kansai University, Yamate-cho 3-3-35, Suita, Osaka 564-8680, JapanYoko YamakoshiLaboratorium für Organische Chemie, ETH Zürich, Vladimir-Prelog-Weg 3, CH-8093 Zürich, Switzerland
2020en
ABI

Abstract

Light-induced oxidative damage of DNA by 1O2 generated from photoexcited C60 was observed at the single-molecule level by atomic force microscopy (AFM) imaging. Two types of DNA origami with uniform morphologies were immobilized on a mica surface and used as DNA substrates. Upon visible light irradiation (528 nm) in the presence of a C60 aqueous solution, the morphology changes of DNA origami substrates were observed by time-lapse AFM imaging at the single-molecule level by tracking a discrete DNA molecule. The origami showed nicked and flattened morphologies with relaxed features caused by the covalent cleavage of the DNA strands. The involvement of 1O2 in the on-surface DNA damage was clearly confirmed by AFM experiments in the presence of a 1O2 quencher and ESR measurements with a spin-trapping agent for 1O2. This study is the first example of single-molecule observation of oxidative damage of DNA by AFM with corresponding morphology changes in a photocontrolled and time-dependent manner by 1O2 generated catalytically from photoexcited C60.

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