Effect of deposition parameters on the superhardness and stoichiometry of nanostructured Ti–Hf–Si–N films
A. D. PogrebnyakG. V. Kurdyumov Institute for Metal Physics, NAS of Ukraine, Kiev, UkraineВ. М. БересневA. P. ShpakG. V. Kurdyumov Institute for Metal Physics, NAS of Ukraine, Kiev, UkraineP. KonarskiiTele and Radio Research Institute, Warsaw, PolandФ. Ф. КомаровBelarusian State University, Minsk, BelarusГ. В. КірікConcern “Ukrrosmetall”, Sumy, UkraineN. A. MakhmudovSamarkand Branch of Tashkent University of Information Technology, Samarkand, UzbekistanД. А. КолесниковBelgorod State University, Belgorod, RussiaВ.В. УгловBelarusian State University, Minsk, BelarusО. В. СобольNational Technical University, Kharkov, UkraineM. V. KaverinSumy State University, Sumy Institute for Surface Modification, Sumy, UkraineВ. В. Грудницкий
ABI
Abstract
No abstract available.