Direct measurement of electron-phonon coupling<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msup><mml:mrow><mml:mi>α</mml:mi></mml:mrow><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msup></mml:mrow><mml:mi>F</mml:mi><mml:mo>(</mml:mo><mml:mi>ω</mml:mi><mml:mo>)</mml:mo></mml:math>using point contacts: Noble metals
A. G. M. JansenPhysics Laboratory and Research Institute for Materials, University of Nijmegen, Toernooiveld, Nijmegen, The NetherlandsF. M. MuellerPhysics Laboratory and Research Institute for Materials, University of Nijmegen, Toernooiveld, Nijmegen, The NetherlandsP. WyderPhysics Laboratory and Research Institute for Materials, University of Nijmegen, Toernooiveld, Nijmegen, The Netherlands
1977lv
ABI
Abstract
A new technique of forming tiny point contacts between normal metals is described. By measuring the voltage derivative of the resistance of such contacts at 1.2 K, structure is found which is consistent with bulk-phonon densities of states. Similar results were reported recently by Yanson using a shorted-film technique. When interpreted, the observed structures yield electron-phonon coupling parameters in close agreement with literature values.
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Cited by 90 references