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Step decoration during deposition of Co on Ag(001) by ultralow energy ion beams

J DekosterInstituut voor Kern- en Stralingsfysica, Celestijnenlaan 200D, B-3001 Leuven, BelgiumB. DegrooteInstituut voor Kern- en Stralingsfysica, Celestijnenlaan 200D, B-3001 Leuven, BelgiumH. PattynInstituut voor Kern- en Stralingsfysica, Celestijnenlaan 200D, B-3001 Leuven, BelgiumG. LangoucheInstituut voor Kern- en Stralingsfysica, Celestijnenlaan 200D, B-3001 Leuven, BelgiumA. VantommeInstituut voor Kern- en Stralingsfysica, Celestijnenlaan 200D, B-3001 Leuven, BelgiumStefan DegrooteInstituut voor Kern- en Stralingsfysica, Celestijnenlaan 200D, B-3001 Leuven, Belgium
1999en
ABI

Abstract

A possibility for decorating atomic steps on single-crystal surfaces by using ultralow energy ion beams is reported. Isotopically pure ion beams are produced by a mass separator and subsequently decelerated by an electrostatic lens. The lens was designed to allow sweeping of the ion beam in order to obtain a uniform deposition over a large area. The preferred sites of single Co atoms on Ag are investigated with in situ scanning tunneling microscopy measurements. A clear indication is found that by increasing the energy of the deposited Co to several electron volts, an enhanced Co decoration of the Ag steps is induced. This technology opens perspectives for an increasing number of elements which can form self-organized nanostructures such as atomic wires on vicinal crystal surfaces.

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