Low peak power deposition regime in HiPIMS: Deposition of hard and dense nanocomposite Ti-Si-N films by DOMS without the need of energetic bombardment
Filipe FernandesDepartment of Control Engineering, Czech Technical University in Prague, Technicka 2, Prague 6 166 27, Czech RepublicS. Calderon V.INL - International Iberian Nanotechnology Laboratory, Av. Mestre José Veiga s/n, 4715-330 Braga, PortugalPaulo J. FerreiraINL - International Iberian Nanotechnology Laboratory, Av. Mestre José Veiga s/n, 4715-330 Braga, PortugalA. CavaleiroUniversity of Coimbra, CEMMPRE - Centre for Mechanical Engineering Materials and Processes, Department of Mechanical Engineering, Rua Luís Reis Santos, 3030-788 Coimbra, PortugalJ.C. OliveiraUniversity of Coimbra, CEMMPRE - Centre for Mechanical Engineering Materials and Processes, Department of Mechanical Engineering, Rua Luís Reis Santos, 3030-788 Coimbra, Portugal
2020en
ABI
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Cited by 30 references