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Application of atomic and molecular primary ions for TOF–SIMS analysis of additive containing polymer surfaces

D. StapelPhysikalisches Institut, Universität Münster, Wihelm-Klemm-Strasse 10, D-48149 Münster, FRG, GermanyA. BenninghovenPhysikalisches Institut, Universität Münster, Wihelm-Klemm-Strasse 10, D-48149 Münster, FRG, Germany
2001en
ABI

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