Strain-relaxation and critical thickness of epitaxial La1.85Sr0.15CuO4 films
T. MeyerOak Ridge National Laboratory 1 Materials Science and Technology Division, , Oak Ridge, Tennessee 37831, USALu JiangOak Ridge National Laboratory 1 Materials Science and Technology Division, , Oak Ridge, Tennessee 37831, USASunho ParkOak Ridge National Laboratory 1 Materials Science and Technology Division, , Oak Ridge, Tennessee 37831, USAT. EgamiOak Ridge National Laboratory 1 Materials Science and Technology Division, , Oak Ridge, Tennessee 37831, USAHo Nyung LeeOak Ridge National Laboratory 1 Materials Science and Technology Division, , Oak Ridge, Tennessee 37831, USA
2015en
ABI
Abstract
We report the thickness-dependent strain-relaxation behavior and the associated impacts upon the superconductivity in epitaxial La1.85Sr0.15CuO4 films grown on different substrates, which provide a range of strain. We have found that the critical thickness for the onset of superconductivity in La1.85Sr0.15CuO4 films is associated with the finite thickness effect and epitaxial strain. In particular, thin films with tensile strain greater than ∼0.25% revealed no superconductivity. We attribute this phenomenon to the inherent formation of oxygen vacancies that can be minimized via strain relaxation.
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