Creation of microrelief on frontal surface of SC structures using selective coatings
Р. А. МуминовPhysicotechnical Institute, NPO Fizika-Solntse, the Academy of Sciences of the Republic of Uzbekistan, Tashkent, UzbekistanМ. Н. ТурсуновPhysicotechnical Institute, NPO Fizika-Solntse, the Academy of Sciences of the Republic of Uzbekistan, Tashkent, UzbekistanU. B. AbdievPhysicotechnical Institute, NPO Fizika-Solntse, the Academy of Sciences of the Republic of Uzbekistan, Tashkent, UzbekistanZ. S. SettarovaPhysicotechnical Institute, NPO Fizika-Solntse, the Academy of Sciences of the Republic of Uzbekistan, Tashkent, Uzbekistan
ABI
Аннотация
A new technique of creating photosensitive structures on semiconductor materials is proposed. The morphology of the surface of the diffusion layers is considered. The creation of microrelief on the frontal surface of photosensitive structures is described.
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Цитирований: 0Использованных источников: 6
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