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Mechanism of Imprinting Process in the Ni-P Metallic Glass Films: A Molecular Dynamics Study

Tri Widodo Besar RiyadiFaculty of Engineering, Universitas Muhammadiyah Surakarta, Surakarta, IndonesiaR. SivaramanDepartment of Mathematics, Dwaraka Doss Goverdhan Doss Vaishnav College, University of Madras, Chennai Arumbakkam, IndiaAlaa Mohammed Hussein WaisFarag M. A. AltalbawyDepartment of Chemistry, University College of Duba, Tabuk University, Duba 71911, Saudi ArabiaUlugbek Oybutaevich KhudanovDepartment of Chemistry and Its Teaching Methods, Jizzakh State Pedagogical Institute Named After Abdullah Kadiri, Jizzakh, UzbekistanDinesh Kumar ChaudharyDepartment of Physics, Amrit Campus, Tribhuvan University, Kathmandu, Nepal
ABI

Аннотация

In this study, the molecular dynamics (MD) simulation was used to evaluate the role of imprinting temperature and the mold-cavity geometry on the imprinted Ni-P metallic glass (MG) films. Considering the outcomes of simulation, it was found that the tip-like and groove patterns showed different filling time for the imprinting process. At room temperature (300 K), the plastic deformation in the tip-like pattern was in a ring shape enclosing the mold, while the plastic deformation in the groove-pattern geometry was mainly localized at the wall of mold. Moreover, it was determined that the imprinting at high temperature (700 K) led to the shortening of pattern filling time and the decrease of loading force in both geometries. The strain concentration and localized plastic deformation were also removed in the high-temperature imprinting process. On the other hand, the unloading process at room temperature (300 K) improved the imprinting quality due to the lower elastic recovery.

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