Работы, цитирующие эту работу

Работ: 1

Работа: Customized modulation on plasma uniformity by non-uniform magnetic field in capacitively coupled plasma

1. Enhancing plasma uniformity in SiH4/NH3 capacitively coupled plasmas via dielectric structure adjustment positioning adjacent to the power electrode

   Sen Wang, Quan‐Zhi Zhang, Maksudbek Yusupov +1

   СтатьяPlasma Diagnostics and ApplicationsJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena2025Цитирований: 0

   ABIABI:AkademIndex/openalex/2025.article.009577