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Extreme ultraviolet vector beams driven by infrared lasers

Carlos Hernández-GarcíaGrupo de Investigación en Aplicaciones del Láser y Fotónica, Departamento de Física Aplicada, University of Salamanca, E-37008 Salamanca, SpainAlex TurpinCenter of Advanced European Studies and Research, 53175 Bonn, GermanyJulio San RománGrupo de Investigación en Aplicaciones del Láser y Fotónica, Departamento de Física Aplicada, University of Salamanca, E-37008 Salamanca, SpainAntonio PicónGrupo de Investigación en Aplicaciones del Láser y Fotónica, Departamento de Física Aplicada, University of Salamanca, E-37008 Salamanca, SpainRokas DrevinskasOptoelectronics Research Centre, University of Southampton, UKAušra ČerkauskaitėOptoelectronics Research Centre, University of Southampton, UKPeter G. KazanskyOptoelectronics Research Centre, University of Southampton, UKCharles G. DurfeeDepartment of Physics, Colorado School of Mines, Golden, Colorado 80401, USAÍñigo J. SolaGrupo de Investigación en Aplicaciones del Láser y Fotónica, Departamento de Física Aplicada, University of Salamanca, E-37008 Salamanca, Spain
2017en
ABI

Аннотация

Vector beams, beams with a non-uniform state of polarization, have become an indispensable tool in many areas of science and technology. Harnessing topological light properties paves the way to control and manipulate light–matter interactions at different levels, from the quantum to macroscopic physics. Here we generate tabletop extreme ultraviolet (EUV) vector beams driven by high-order harmonic generation (HHG). Our experimental and theoretical results demonstrate that HHG imprints the polarization state of the fundamental (infrared) beam, ranging from radial to azimuthal, into the higher frequency radiation. Our numerical simulations also demonstrate that the generated high-order harmonic beams can be synthesized into attosecond vector beams in the EUV/soft x-ray regime. Our proposal overcomes the state-of-the-art-limitations for the generation of vector beams far from the visible domain and could be applied in fields such as diffractive imaging, EUV lithography, or ultrafast control of magnetic properties.

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