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Minkowski functional characterization and fractal analysis of surfaces of titanium nitride films

Alireza Grayeli KorpiPhysics and Accelerators Research School, Nuclear Sciences and Technology Research Institute, Tehran, IranŞtefan ŢăluTechnical University of Cluj-Napoca, The Directorate of Research, Development and Innovation Management (DMCDI), Constantin Daicoviciu St., no. 15, Cluj-Napoca, 400020, Cluj county, RomaniaMirosław BramowiczUniversity of Warmia and Mazury in Olsztyn, Faculty of Technical Sciences, Oczapowskiego 11, 10-719 Olsztyn, PolandAli ArmanVacuum Technology Research Group, ACECR, Sharif University Branch, Tehran, IranSławomir KuleszaUniversity of Warmia and Mazury in Olsztyn, Faculty of Mathematics and Computer Science, Sloneczna 54, 10-710 Olsztyn, PolandBartosz PszczółkowskiUniversity of Warmia and Mazury in Olsztyn, Faculty of Mathematics and Computer Science, Sloneczna 54, 10-710 Olsztyn, PolandStanislav JurečkaUniversity of Žilina, Faculty of Electrical Engineering, Institute of Aurel Stodola, Nálepku 1390, 031 01 Liptovský Mikuláš, SlovakiaMohsen MardaniVacuum Technology Research Group, ACECR, Sharif University Branch, Tehran, IranCarlos LunaUniversidad Autónoma de Nuevo León (UANL), Facultad de Ciencias Físico Matemáticas (FCFM), Av. Universidad s/n, San Nicolás de los Garza, Nuevo León 66455, MexicoP. BalashabadiPhysics and Accelerators Research School, Nuclear Sciences and Technology Research Institute, Tehran, IranSahar RezaeeDepartment of Physics, Kermanshah Branch, Islamic Azad University, Kermanshah, IranSabavath Gopikishan
2019en
ABI

Аннотация

The aim of this study is to gain a deeper understanding of the micromorphology characteristics of thin titanium nitride (TiN) films sputtered on glass substrates by using ion beam sputtering (IBS). For that purpose, TiN samples were deposited onto glass substrates from gas mixtures with different contents of molecular nitrogen and argon atoms. Atomic force microscopy (AFM) was used to characterize the surface microtexture of obtained thin films at high magnification. The detailed analysis of AFM images using Minkowski functionals and fractal analysis reveals a significant effect of the preparation conditions on the surface features with non-monotonic dependences. Presented results suggest that non-classical spatial characteristics of the variability of the surface topography, including fractal dimension, corner frequency, roughness, and feature shape and size, can be tuned having control over the relative flow rates of the gas mixture during film deposition.

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Цитирований: 3Использованных источников: 0