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Controllable Interface Engineering for the Preparation of High Rate Silicon Anode

Lei WangFaculty of Metallurgical and Energy Engineering/State Key Laboratory of Complex Nonferrous Metal Resources Clean Utilization Kunming University of Science and Technology Kunming 650093 ChinaJijun LuFaculty of Metallurgical and Energy Engineering/State Key Laboratory of Complex Nonferrous Metal Resources Clean Utilization Kunming University of Science and Technology Kunming 650093 ChinaShaoyuan LiFaculty of Metallurgical and Energy Engineering/State Key Laboratory of Complex Nonferrous Metal Resources Clean Utilization Kunming University of Science and Technology Kunming 650093 ChinaFengshuo XiFaculty of Metallurgical and Energy Engineering/State Key Laboratory of Complex Nonferrous Metal Resources Clean Utilization Kunming University of Science and Technology Kunming 650093 ChinaZhongqiu TongFaculty of Metallurgical and Energy Engineering/State Key Laboratory of Complex Nonferrous Metal Resources Clean Utilization Kunming University of Science and Technology Kunming 650093 ChinaXiuhua ChenSchool of Materials Science and Engineering Yunnan University Kunming 650091 ChinaKuixian WeiWenhui MaFaculty of Metallurgical and Energy Engineering/State Key Laboratory of Complex Nonferrous Metal Resources Clean Utilization Kunming University of Science and Technology Kunming 650093 China
2024en
ABI

Аннотация

Abstract Silicon (Si) is considered to be the promising candidate anode for the next generation of high‐energy‐density batteries. However, the poor initial coulombic efficiency (ICE) and rate performance severely hinder its commercial development. Here, fully exploits the 2D structure of photovoltaic silicon waste (PV‐WSi), combining with the advantage of controllable depositing layers offered by fluidized bed atomic layer deposition (FBALD), to simultaneously achieve high ICE and highrate performance of Si‐based anodes. The characteristic of Li + embedding vertically into the plane direction of the 2D sheet‐like structure of PV‐WSi helps shorten the diffusion distance, alleviating the pulverization problem caused by volume expansion. FBALD is utilized to controllably deposit Li 2 O (≈1 nm) and TiO 2 (≈4 nm) layers to compensate for the loss of Li sources, further suppressing the volume expansion of Si and isolating the side reactions between Si and electrolyte. The prepared Si@Li 2 O@TiO 2 demonstrates ultrahigh ICE (90.9%) and outstanding rate performance (>900 mAh g −1 at a rate of 20 A g −1 ). Full cells with the Si@Li 2 O@TiO 2 anode and LiFePO 4 cathode deliver a stable capacity of 100 mAh g −1 after 300 cycles at 0.5 C. This work provides new ideas for the development of high ICE, high‐rate Si‐based anodes based on low‐cost photovoltaic waste.

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