Pure-Silica Zeolite Low-k Dielectric Thin Films
Zhong Lin WangDepartment of Chemical and Environmental Engineering, University of California, Riverside, CA 92521 (USA)Huanting WangDepartment of Chemical and Environmental Engineering, University of California, Riverside, CA 92521 (USA)Aritra MitraDepartment of Chemical and Environmental Engineering, University of California, Riverside, CA 92521 (USA)Limin HuangDepartment of Chemical and Environmental Engineering, University of California, Riverside, CA 92521 (USA)Yushan YanDepartment of Chemical and Environmental Engineering, University of California, Riverside, CA 92521 (USA)
2001en
ABI
Аннотация
Dielectric materials with a very low dielectric constant, k, will be required to overcome problems such as cross-talk and propagation delay in future generations of microprocessors, whose features are becoming increasingly smaller. Here pure-silica zeolite is examined as an alternative low-k material. Thin films prepared by in-situ crystallization (see Figure) and a spin-on process are compared.
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