Статья

Photoluminescence dependence of ZnO films grown on Si(100) by radio-frequency magnetron sputtering on the growth ambient

Sang‐Hun JeongDepartment of Materials Science and Engineering, Photonic and Electronic Thin Film Laboratory, Chonnam National University, 300, Yongbong-dong, Puk-gu, Kwangju 500-757, South KoreaBongsoo KimDepartment of Materials Science and Engineering, Photonic and Electronic Thin Film Laboratory, Chonnam National University, 300, Yongbong-dong, Puk-gu, Kwangju 500-757, South KoreaByung‐Teak LeeDepartment of Materials Science and Engineering, Photonic and Electronic Thin Film Laboratory, Chonnam National University, 300, Yongbong-dong, Puk-gu, Kwangju 500-757, South Korea

2003en

ABI

Аннотация

We report the effects of the growth ambient on photoluminescence (PL) emission properties of ZnO films grown on Si (100) by rf magnetron sputtering. Upon increasing the O2/Ar+O2 ratio in the growing ambient, the visible emission in the room-temperature PL spectra was drastically suppressed without sacrificing the band-edge emission intensity in the ultraviolet region. This tendency is estimated to be due to the reduction of the oxygen vacancies and zinc interstitials in the film induced by the improvement of the film stoichiometry with respect to high oxygen content, indicating that the visible emission in ZnO originates from oxygen vacancy or zinc interstitial related defects. The violet emission peaked at about 401 nm (3.09 eV) was observed in the low-temperature PL spectra of the ZnO films grown under oxygen-rich conditions. This emission band was assigned to the electron transition from the bottom of the conduction band to the Zn vacancy level, positioned approximately 3.06 eV below the conduction band edge.

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Идентификаторы

DOI: 10.1063/1.1568543

Цитирования и источники

Цитирований: 6Использованных источников: 0

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