On the ion and neutral atom bombardment of the growth surface in magnetron plasma sputter deposition
E.D. van HattumUtrecht University Surfaces, Interfaces and Devices, Department of Physics and Astronomy, Faculty of Science, , P.O. Box 80000, 3508 TC Utrecht, The NetherlandsAlberto PalmeroUtrecht University Surfaces, Interfaces and Devices, Department of Physics and Astronomy, Faculty of Science, , P.O. Box 80000, 3508 TC Utrecht, The NetherlandsW.M. ArnoldbikUtrecht University Surfaces, Interfaces and Devices, Department of Physics and Astronomy, Faculty of Science, , P.O. Box 80000, 3508 TC Utrecht, The NetherlandsH. RudolphUtrecht University Surfaces, Interfaces and Devices, Department of Physics and Astronomy, Faculty of Science, , P.O. Box 80000, 3508 TC Utrecht, The NetherlandsF.H.P.M. HabrakenUtrecht University Surfaces, Interfaces and Devices, Department of Physics and Astronomy, Faculty of Science, , P.O. Box 80000, 3508 TC Utrecht, The Netherlands
2007en
ABI
Аннотация
The energy distribution of positive argon ions bombarding the substrate during radiofrequency magnetron sputter deposition has been measured as a function of the argon pressure. The results are related to measurements of the plasma potential distribution and understood invoking the occurrence of resonant charge transfer reactions. This effectively lowers the ion bombardment energy and causes the bombardment of the growth surface with neutrals of a few eV kinetic energy in the pressure range of 0.1–1Pa.
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