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Ideal Graphene/Silicon Schottky Junction Diodes

Dhiraj SinhaCollege of Nanoscale Science and Engineering, The State University of New York, Albany, New York 12203, United StatesJi Ung LeeCollege of Nanoscale Science and Engineering, The State University of New York, Albany, New York 12203, United States
2014en
ABI

Аннотация

The proper understanding of semiconductor devices begins at the metal-semiconductor interface. The metal/semiconductor interface itself can also be an important device, as Schottky junctions often forms when the doping in the semiconductors is low. Here, we extend the analysis of metal-silicon Schottky junctions by using graphene, an atomically thin semimetal. We show that a fundamentally new transport model is needed to describe the graphene-silicon Schottky junction. While the current-voltage behavior follows the celebrated ideal diode behavior, the details of the diode characteristics is best characterized by the Landauer transport formalism, suggesting that the injection rate from graphene ultimately determines the transport properties of this new Schottky junction.

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Цитирований: 2Использованных источников: 0