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A numerical simulation study of gallium-phosphide/silicon heterojunction passivated emitter and rear solar cells

Hannes WagnerARC Photovoltaics Centre of Excellence, University of New South Wales (UNSW) 2 , Sydney, NSW 2052, AustraliaTobias OhrdesInstitute for Solar Energy Research Hamelin (ISFH) 3 , 31860 Emmerthal, GermanyAmir Dastgheib-ShiraziDiv. Photovoltaics, Department of Physics, University of Konstanz 4 , 78457 Konstanz, GermanyBinesh Puthen VeettilARC Photovoltaics Centre of Excellence, University of New South Wales (UNSW) 2 , Sydney, NSW 2052, AustraliaDirk KönigARC Photovoltaics Centre of Excellence, University of New South Wales (UNSW) 2 , Sydney, NSW 2052, AustraliaPietro P. AltermattDepartment of Solar Energy, Institute Solid-State Physics, Leibniz University of Hannover 1 , Appelstr. 2, 30167 Hannover, Germany
2014en
ABI

Аннотация

The performance of passivated emitter and rear (PERC) solar cells made of p-type Si wafers is often limited by recombination in the phosphorus-doped emitter. To overcome this limitation, a realistic PERC solar cell is simulated, whereby the conventional phosphorus-doped emitter is replaced by a thin, crystalline gallium phosphide (GaP) layer. The resulting GaP/Si PERC cell is compared to Si PERC cells, which have (i) a standard POCl3 diffused emitter, (ii) a solid-state diffused emitter, or (iii) a high efficiency ion-implanted emitter. The maximum efficiencies for these realistic PERC cells are between 20.5% and 21.2% for the phosphorus-doped emitters (i)–(iii), and up to 21.6% for the GaP emitter. The major advantage of this GaP hetero-emitter is a significantly reduced recombination loss, resulting in a higher Voc. This is so because the high valence band offset between GaP and Si acts as a nearly ideal minority carrier blocker. This effect is comparable to amorphous Si. However, the GaP layer can be contacted with metal fingers like crystalline Si, so no conductive oxide is necessary. Compared to the conventional PERC structure, the GaP/Si PERC cell requires a lower Si base doping density, which reduces the impact of the boron-oxygen complexes. Despite the lower base doping, fewer rear local contacts are necessary. This is so because the GaP emitter shows reduced recombination, leading to a higher minority electron density in the base and, in turn, to a higher base conductivity.

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