Перейти к основному содержанию
AkademIndex

Продукты

Для разработчиков

AkademBaseОткрытый API экосистемы
Статья

Impact of Microstructure on MoS<sub>2</sub> Oxidation and Friction

John F. CurryMaterials Science and Engineering Center, Sandia National Laboratories, Albuquerque, New Mexico 87123, United StatesMark WilsonMaterials Science and Engineering Center, Sandia National Laboratories, Albuquerque, New Mexico 87123, United StatesH. S. LuftmanNicholas C. StrandwitzNicolas ArgibayMaterials Science and Engineering Center, Sandia National Laboratories, Albuquerque, New Mexico 87123, United StatesMichael ChandrossMaterials Science and Engineering Center, Sandia National Laboratories, Albuquerque, New Mexico 87123, United StatesMark A. SidebottomBrandon A. Krick
2017en
ABI

Аннотация

This work demonstrates the role of microstructure in the friction and oxidation behavior of the lamellar solid lubricant molybdenum disulfide (MoS2). We report on systematic investigations of oxidation and friction for two MoS2 films with distinctively different microstructures—amorphous and planar/highly-ordered—before and after exposure to atomic oxygen (AO) and high-temperature (250 °C) molecular oxygen. A combination of experimental tribology, molecular dynamics simulations, X-ray photoelectron spectroscopy (XPS), and high-sensitivity low-energy ion scattering (HS-LEIS) was used to reveal new insights about the links between structure and properties of these widely utilized low-friction materials. Initially, ordered MoS2 films showed a surprising resistance to both atomic and molecular oxygens (even at elevated temperature), retaining characteristic low friction after exposure to extreme oxidative environments. XPS shows comparable oxidation of both coatings via AO; however, monolayer resolved compositional depth profiles from HS-LEIS reveal that the microstructure of the ordered coatings limits oxidation to the first atomic layer.

Перевод пока недоступен

Идентификаторы

Цитирования и источники

Цитирований: 2Использованных источников: 0