Doping of silicon with selenium by diffusion from the gas phase

Selenium-doped silicon single crystals are studied for the case of an impurity introduced by diffusion from the gas phase. Doping is performed in sealed quartz ampules at a temperature of 1240°C over the course of 240 h. The dependence of the concentration of the introduced deep donor centers of various types on the diffusant vapor pressure p Se is examined. It is found that samples with a concentration of atomic Se centers exceeding 1015 cm−3 can be obtained at comparatively low p Se (0.02–0.06 atm). In this case, the content of diatomic Se2 complexes is lower by an order of magnitude and more. The results obtained may be of interest for those who study nonlinear optical phenomena involving deep donor centers in silicon.

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