DFT study of gas responses to CH4, H2S, and CO on TM Atom (Sc, V, Cr, Mn)-modified HfSe2 monolayers
Taili WangHenan Key Laboratory of Materials on Deep-Earth Engineering, School of Materials Science and Engineering, Henan Polytechnic university, Jiaozuo 454000, Henan, ChinaDongbin WangHenan Key Laboratory of Materials on Deep-Earth Engineering, School of Materials Science and Engineering, Henan Polytechnic university, Jiaozuo 454000, Henan, ChinaKun XieHenan Key Laboratory of Materials on Deep-Earth Engineering, School of Materials Science and Engineering, Henan Polytechnic university, Jiaozuo 454000, Henan, ChinaPengtao WangHenan Key Laboratory of Materials on Deep-Earth Engineering, School of Materials Science and Engineering, Henan Polytechnic university, Jiaozuo 454000, Henan, ChinaXinchun LiHenan Key Laboratory of Materials on Deep-Earth Engineering, School of Materials Science and Engineering, Henan Polytechnic university, Jiaozuo 454000, Henan, ChinaChaowen XueHenan Key Laboratory of Materials on Deep-Earth Engineering, School of Materials Science and Engineering, Henan Polytechnic university, Jiaozuo 454000, Henan, ChinaLong LinHenan Key Laboratory of Materials on Deep-Earth Engineering, School of Materials Science and Engineering, Henan Polytechnic university, Jiaozuo 454000, Henan, ChinaYe ShenCollege of Chemistry and Chemical Engineering, Henan Polytechnic university, Jiaozuo 454000, Henan, China
2024en
ABI
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