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Performance limiting surface defects in SiC epitaxial p-n junction diodes

Tsunenobu KimotoDepartment of Electronic Science and Engineering, Kyoto University, Kyoto, JapanN. MiyamotoDepartment of Electronic Science and Engineering, Kyoto University, Kyoto, JapanH. MatsunamiDepartment of Electronic Science and Engineering, Kyoto University, Kyoto, Japan
1999en
ABI

Аннотация

Effects of surface defects on performance of kV-class 4H- and 6H-SiC epitaxial p-n junction diodes were investigated. The perimeter recombination and generation, instead of the bulk process, are responsible for forward recombination current and reverse leakage current of the diodes, respectively. Mapping studies of surface morphological defects have revealed that triangular-shaped defects severely degrade high-blocking capability of the diodes whereas shallow round pits and scratch give no direct impact. Device-killing defects in SiC epilayers are discussed based on breakdown voltage mapping. Effective minority carrier lifetimes are mainly limited not by bulk recombination but by perimeter recombination.

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