Tunneling via surface dislocation in W/β-Ga₂O₃ Schottky barrier diodes

Abstract In this work, W/ β -Ga 2 O 3 Schottky barrier diodes, prepared using a confined magnetic field-based sputtering method, were analyzed at different operation temperatures. Firstly, Schottky barrier height increased with increasing temperature from 100 to 300 K and reached 1.03 eV at room temperature. The ideality factor decreased with increasing temperature and it was higher than 2 at 100 K. This apparent high value was related to the tunneling effect. Secondly, the series and on-resistances decreased with increasing operation temperature. Finally, the interfacial dislocation was extracted from the tunneling current. A high dislocation density was found, which indicates the domination of tunneling through dislocation in the transport mechanism. These findings are evidently helpful in designing better performance devices.

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