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Piezoelectric properties of ScAlN thin films for piezo-MEMS devices

Keiichi UmedaMurata Manufacturing Company Limited, JapanHiroyuki KawaiMurata Manufacturing Company Limited, JapanAkira HondaMurata Manufacturing Company Limited, JapanMorito AkiyamaNational Institute of Advanced Industrial Science and Technology (AIST), JapanTakahisa KatoMurata Manufacturing Company Limited, JapanTadao FukuraMurata Manufacturing Company Limited, Japan
2013en
ABI

Аннотация

This paper reports the piezoelectric properties of ScAlN thin films. We evaluated the piezoelectric coefficients d <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">33</sub> and d <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">31</sub> of Sc <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">x</sub> Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">1-x</sub> N thin films directly deposited onto silicon wafers, as well the radio frequency (RF) electrical characteristics of Sc <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.35</sub> Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.65</sub> N bulk acoustic wave (BAW) resonators at around 2 GHz, and found a maximum value for d <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">33</sub> of 28 pC/N and a maximum -d <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">31</sub> of 13 pm/V at 40% scandium concentration. In BAW resonators that use Sc <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.35</sub> Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.65</sub> N as a piezoelectric film, the electromechanical coupling coefficient k <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> (=15.5%) was found to be 2.6 times that of resonators with AlN films. These experimental results are in very close agreement with first-principles calculations. The large electromechanical coupling coefficient and high sound velocity of these films should make them suitable for high frequency applications.

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