On high dose nitrogen implantation of PVD titanium nitride
Yurii P. SharkeevInstitute of Strength Physics and Materials Science of RAS, Siberian Branch, Tomsk 634021, RussiaS.J. BullSchool of Chemical Engineering and Advanced Materials, University of Newcastle, Newcastle-upon-Tyne, NE1 7RU, UKA.J. PerryMelissa KlingenbergConcurrent Technologies Corporation, 100 CTC Drive, Johnstown, PA 15904, USAС. В. ФортунаTomsk State University of Architecture and Building, Tomsk 634003, RussiaMarkus MichlerInstitut für Mikrosystemtechnik, Interstate University of Applied Science, 9470 Buchs SG, SwitzerlandRafael R. ManoryИ. А. ШулеповNuclear Physics Institute at Tomsk Polytechnic University, Tomsk 634050, Russia
2005en
ABI
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