Spectroscopy of the neutral sulphur-related centres in silicon
B. PajotGroupe de Physique des Solides de l'Ecole Normale Supérieure, Université Paris V, Tour 23, 2, place Jussieu, 75251 Paris Cedex 05, FranceC. NaudOptique de la Matière Condensée, Tour 13, Université Paris VI, 4, place Jussieu, 75230 Paris Cedex 05, France
1984en
ABI
Аннотация
A high resolution infrared absorption study of silicon samples doped with sulphur by implantation and annealing reveals the presence of four sulphur-related centres, related to the way the samples were annealed out. The centre with an ionization energy of 82.2 meV has not been reported previously. The lines observed are generally sharp and the position of all the odd-parity levels closely match the effective mass theory values while the even-parity transitions are characteristic of each centre. For many lines, the width is comparable to that observed for phosphorus lines at similar concentrations while some specific broadening effects for other lines.
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