Статья

Recent Advances in Graphene-Based Free-Standing Films for Thermal Management: Synthesis, Properties, and Applications

Feng GongSchool of Materials and Energy, University of Electronic Science and Technology of China, Chengdu 611731, ChinaHao LiSchool of Materials and Energy, University of Electronic Science and Technology of China, Chengdu 611731, ChinaWenbin WangSchool of Materials and Energy, University of Electronic Science and Technology of China, Chengdu 611731, ChinaDawei XiaSchool of Materials and Energy, University of Electronic Science and Technology of China, Chengdu 611731, ChinaQiming LiuSchool of Materials and Energy, University of Electronic Science and Technology of China, Chengdu 611731, ChinaDimitrios V. PapavassiliouSchool of Chemical, Biological, and Materials Engineering, University of Oklahoma, Norman, OK 73019, USAZiqiang XuSchool of Materials and Energy, University of Electronic Science and Technology of China, Chengdu 611731, China

2018en

ABI

Аннотация

Thermal management in microelectronic devices has become a crucial issue as the devices are more and more integrated into micro-devices. Recently, free-standing graphene films (GFs) with outstanding thermal conductivity, superb mechanical strength, and low bulk density, have been regarded as promising materials for heat dissipation and for use as thermal interfacial materials in microelectronic devices. Recent studies on free-standing GFs obtained via various approaches are reviewed here. Special attention is paid to their synthesis method, thermal conductivity, and potential applications. In addition, the most important factors that affect the thermal conductivity are outlined and discussed. The scope is to provide a clear overview that researchers can adopt when fabricating GFs with improved thermal conductivity and a large area for industrial applications.

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Идентификаторы

DOI: 10.3390/coatings8020063

Цитирования и источники

Цитирований: 2Использованных источников: 0

Показатели — AkademScholar