P. Konarskii

1 та иш

Tele and Radio Research Institute, Warsaw, Poland

1. Effect of deposition parameters on the superhardness and stoichiometry of nanostructured Ti–Hf–Si–N films

   A. D. Pogrebnyak, В. М. Береснев, A. P. Shpak +9

   МақолаMetal and Thin Film MechanicsRussian Physics Journal20121 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.495543